Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2002-05-30
2009-10-27
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S270100, C430S311000, C430S312000, C430S320000, C430S321000, C430S325000, C430S326000, C430S329000, C430S331000, C430S905000, C430S910000
Reexamination Certificate
active
07608389
ABSTRACT:
Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and analogous resists for biomolecule layer patterning on solid substrates are also described. The processes described enable micropatterning of more than two different proteins on solid substrates without denaturation of the proteins. The preferred resist materials are based on (meth)acrylate copolymers that contain at least one acid cleavable ester group and at least one hydrophilic group such as an alcoholic or a carboxylic group.
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International Search Report.
Argitis Panagiotis
Diakoumakos Constantinos D.
Kakabakos Sotirios E.
Misiakos Konstantinos
Argitis Panagiotis
Kakabakos Sotirios E.
Lee Sin J.
Misiakos Konstantinos
National Centre for Scientific Research Demokritos
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