Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-08-28
1993-02-16
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430270, 430281, G03C 500
Patent
active
051870487
ABSTRACT:
A photoresist coating for use in microlithography comprises a polymer of a monomer of the formula ##STR1## wherein X and Y are strong electron withdrawing groups and R.sup.4 is H or, providing that X and Y are both --CN, R.sup.4 may be aliphatic hydrocarbyl, aryl or alkaryl. Preferred monomers are of the formula ##STR2## wherein R.sup.7 is a C.sub.1 -C.sub.5 alkyl or C.sub.2 -C.sub.5 alkenyl group, more particularly ethyl 2-cyanopenta-2,4-dienoate or allyl 2-cyanopenta-2,4-dienoate.
Methods for applying a resist coating by vapor deposition of these monomers and exposure to radiation are described. A positive or negative tone image can be produced, depending upon the imaging method employed.
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8164 Instrument and Equipment Techniques, vol. 23 (1980) Nov.-Dec., by Gusakov, et al., "Apparatus for Depositing Organic Films from the Vapor State in Response to UV Light".
Coakley Pauline
Guthrie John
Woods John
Chapman Mark A.
Loctite (Ireland) Limited
McCamish Marion E.
Miller Eugene F.
Welch II Edward K.
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