Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-03-13
2007-03-13
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S311000
Reexamination Certificate
active
10690835
ABSTRACT:
Photoresist compositions that contain one or more components having sulfonamide and Si substitution. Preferred photoresist compositions of the invention contain an Si-polymer such as a silsesquioxane that has sulfonamide substitution and may be employed in multilayer resist systems. In preferred aspects, the Si-polymer has both sulfonamide substitution as well as moieties that can provide contrast upon exposure to photogenerated acid.
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DERWENT English abstract for JP 11-327145.
Machine-Assisted English translation for JP 11-327145 (provided by Japan Patent Office).
DERWENT English abstract for JP 2001-201855.
Machine-Assisted English translation for JP 2001-201855 (provided by Japan Patent Office).
Machine-assisted English translation for JP 6-59458, provided by JPO.
Barclay George G.
Kanagasabapathy Subbareddy
Corless Peter F.
Edwards Angell Palmer & Dodge
Frickey Darryl P.
Lee Sin
Shipley Company L.L.C.
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