Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making printing plates
Patent
1997-06-11
1999-10-05
Codd, Bernard
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making printing plates
430309, 430310, 4302771, 4302781, 430197, 430326, 430944, 430945, 101459, 101465, G03F 7008
Patent
active
059621923
ABSTRACT:
Printing plates having a photoresist layer thereon that can be exposed by a computer controller laser have improved sensitivity and do not require a photomask step. We have found photoresists that include a film forming polymer, an organo azide and a photosensitive dye that absorbs light at the frequency of the patterning laser and converts it to heat energy. The heat energy in turn elevates the temperature of the organo azide above its dissociation temperature, destroying the azide in areas exposed to the light source, and solubilizing those regions.
Flood exposure with ultraviolet light hardens the resist and can be performed prior to or after pattern exposure.
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Cai et al, "Conducting Polymers as Deep-UV and Electron Beam Resists: Direct Production of Micrometer Scale Conducting Structures from Poly(3-octylthiophene)", J. Molec. Electronics vol. 7, 1991, pp. 63-68.
European Searcvh Report dated Oct. 13, 1997 for Appln No. 97109966.8.
Holman, III Bruce
Mulvey Merlin L.
Sharkozy Larry
Zaloom Jeffrey G.
Zhou Peiguang
Codd Bernard
Morris Birgit E.
Plantamura Arthur J.
Printing Developments Inc.
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