Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Including heating
Patent
1996-04-03
2000-09-19
Codd, Bernard
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Including heating
430326, 4302701, 430910, 430919, 430921, 522 8, 522 27, 522 28, G03C 516, G03C 173
Patent
active
061209775
ABSTRACT:
An exposure technique which accomplishes high transparency and the prevention of influence of reflected light in the ultraviolet region of KrF excimer laser light, the technique being capable of decreasing reflected light by employing a base polymer having high transparency in the ultraviolet region and by employing a bleaching agent in combination with a photo acid generator, the bleaching agent being capable of preventing the formation of eaves in an upper portion of a resist pattern.
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English Translation of JP-5-265212 Kaigen et al, Oct. 15, 1993.
Kaimoto et al. "Alicyclic Polymer for ArF and KrF Excimer Resist Based on Chemical Amplification," SPIE vol. 1672, Advances in Resist Technology and Processing IX Mar. 1992, pp. 66-73.
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"Chemically Amplified DUV Photoresist Using a New Class of Phoptocaid Generating Compounds", Pawlowski et al, SPIE vol. 1262 Advances in Resist Tehnology and Processing VII, 1990, pp. 16-25.
Kaimoto Yuko
Oikawa Akira
Takechi Satoshi
Codd Bernard
Fujitsu Limited
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