Photoresist supply system with air venting

Details Photoresist supply system with air venting Photoresist supply system with air venting

1996-06-24

1999-01-12

Talbot, Brian K.

Coating processes

Vacuum utilized prior to or during coating

427345, 427444, 95248, 96194, 118603, 118610, B05D 300, B05D 140

Patent

active

058584668

ABSTRACT:
A system for pumping resist to a wafer coating machine includes a line that returns a selected proportion of the resist entering the resist pump to the resist supply tank. The return line to the tank is connected to the pump outlet at a higher point than the pump outlet to the wafer coating machine, and the resist that is returned to the tank carries substantially all of the bubbles that are carried in the resist entering the tank. The bubbles are removed from the resist in the tank and the resist can be used normally.

REFERENCES:
patent: 3345803 (1967-10-01), Smith
patent: 4115085 (1978-09-01), Barbe
patent: 5127362 (1992-07-01), Iwatsu et al.
patent: 5254367 (1993-10-01), Matsumura et al.
patent: 5601635 (1997-02-01), Roffelsen

Affiliated with

Also associated with

Rating

Photoresist supply system with air venting does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoresist supply system with air venting, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist supply system with air venting will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1512621