Photoresist stripping method

Details Photoresist stripping method Photoresist stripping method

1992-04-13

1993-08-17

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156655, 156656, 156668, 156904, 252 791, 430329, B44C 122, B29C 3700, C23F 100

Patent

active

052365522

ABSTRACT:
A bath (19) for stripping a cured electrophoretic resist coating (13) consists of a mixture comprising 0.2-50% of a fluoro-containing acetic acid, less than one percent corrosion inhibitors, and 50-99.8% of an amide solvent, preferably a cyclic amide. The amide solvent is preferably N-methylpyrrolidone, and the acid is preferably trifluoroacetic acid.

REFERENCES:
patent: 3740252 (1973-06-01), Chaikin
patent: 3813309 (1974-05-01), Bakos et al.
patent: 4601972 (1986-07-01), Small, Jr.

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