Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Patent
1999-01-08
2000-06-06
Gupta, Yogendra
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
510175, 510435, 510493, 510500, 510506, G03F 742, C23F 100, H01L 21027
Patent
active
060718684
ABSTRACT:
A photoresist stripping composition is provided. The composition includes 10-30 weight % of alkanolamine, 10-35 weight % of dimethylsulfoxide, 30-50 weight % of N-methylpyrrolidone and 10-30 weight % of glycolether. The composition shows good stripping force and strips photoresist by a single-wafer treatment method using the air-knife process or by a dipping method.
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Choi Dong-uk
Kim Jin-Seock
Kim Yang-Sun
Lee Koog-Lok
Lim Seog-Young
Gupta Yogendra
Samsung Electronics Co,. Ltd.
Webb Gregory E.
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