Photoresist stripper composition and method of use

Details Photoresist stripper composition and method of use Photoresist stripper composition and method of use

1984-01-09

1984-11-20

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Removal of imaged layers

134 38, 252153, 252162, 252170, 252172, 430260, 430331, B08B 308, C11D 750, C23G 502

Patent

active

044839170

ABSTRACT:
An improved process for removing crosslinked photoresist polymer from printed circuit boards which comprises contacting the printed circuit board with methylene chloride containing from about 5 to about 10 volume percent of a mixture of methanol and methyl formate. Each additive must be present at a minimum concentration of one volume percent. Stabilizers for the methylene chloride, such as epoxides, may be present at amounts no greater than about 0.5 volume percent.

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