Photoresist residue removing liquid composition

Details Photoresist residue removing liquid composition Photoresist residue removing liquid composition

2005-03-08

2005-03-08

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

C430S329000, C134S003000, C510S176000

Reexamination Certificate

active

06864044

ABSTRACT:
The object of the present invention is to provide, in the production of semiconductor circuit elements, a photoresist residue removing liquid composition which is excellent for removing photoresist residues after dry etching without attacking the wiring material or the interlayer insulating film etc.This is made possible by a photoresist residue removing liquid composition containing one or more members selected from the group consisting of reducing compounds and their salts and one or more members selected from the group consisting of aliphatic polycarboxylic acids and their salts.

REFERENCES:
patent: 3689292 (1972-09-01), Preston
patent: 4014715 (1977-03-01), Preston
patent: 5334332 (1994-08-01), Lee
patent: 5466297 (1995-11-01), Goodman et al.
patent: 5480585 (1996-01-01), Shiotsu et al.
patent: 5567574 (1996-10-01), Hasemi et al.
patent: 5612304 (1997-03-01), Honda et al.
patent: 5678232 (1997-10-01), D'Muhala
patent: 6228823 (2001-05-01), Morinaga et al.
patent: 6231677 (2001-05-01), Ishikawa et al.
patent: 6458517 (2002-10-01), Nohara et al.
patent: 20020037479 (2002-03-01), Schwartzkopf et al.
patent: 0647884 (1995-04-01), None
patent: 662705 (1995-12-01), None
patent: 0897975 (1999-02-01), None
patent: 0939344 (1999-09-01), None
patent: 1063689 (2000-12-01), None
patent: 1603558 (1995-05-01), None
patent: 2 354 086 (1999-10-01), None
patent: 2001-83712 (1990-04-01), None
patent: 5-281753 (1993-10-01), None
patent: 7-201794 (1995-08-01), None
patent: 8-262746 (1996-10-01), None
patent: 11-316464 (1999-11-01), None
patent: 2000-162788 (2000-06-01), None
patent: 2000-232063 (2000-08-01), None
patent: 2001-22095 (2001-01-01), None
patent: 2001-22096 (2001-01-01), None

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