Photoresist processing solution with quaternary ammonium hydroxi

Details Photoresist processing solution with quaternary ammonium hydroxi Photoresist processing solution with quaternary ammonium hydroxi

1985-10-08

1988-03-08

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430326, 252528, 252529, 252547, 252548, G03C 500, G03C 524, G03C 534

Patent

active

047299410

ABSTRACT:
A photoresist processing solution includes a 2-hydroxyethyl-(mono-or polyoxyethyl) trialkyl ammonium hydroxide and is used in a process for development of photoresists having a solubility in aqueous alkaline solution which is a function of exposure to light.

REFERENCES:
patent: 2185163 (1939-12-01), Ulrich
patent: 3586504 (1971-06-01), Coates et al.
patent: 4239661 (1980-12-01), Muraoka et al.
patent: 4339340 (1982-07-01), Muraoka et al.
patent: 4411735 (1983-10-01), Belani
patent: 4411981 (1983-10-01), Minezaki
patent: 4464461 (1984-08-01), Guild
patent: 4576903 (1986-03-01), Baron et al.
Van Nostrand's Scientific Encyclopedia, Sixth Edition, pp. 887-888.
M. Asano, T. Cho and H. Muraoka; "Application of Choline in Semiconductor Technology"; Oct. 17-22, 1976, p. 911.

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