Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Reexamination Certificate
2005-05-31
2005-05-31
Le, Hoa Van (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
C510S466000
Reexamination Certificate
active
06900003
ABSTRACT:
A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.
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Abstracts of JP 04174850, Jun. 23, 1992.
Anzures Edgardo
Barr Robert K.
Lundy Daniel E.
O'Connor Corey
Le Hoa Van
Piskorski John J.
Shipley Company L.L.C.
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