Photoresist process of fabricating microelectronic circuits usin

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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430 5, 430142, 430312, 430326, 430329, G03F 726

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048046140

ABSTRACT:
In a photolithographic process for fabricating microelectronic circuits, a contrast enhancing layer soluble in either water or developer that is selectively applied to a photoresist layer residing on a substrate.

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Griffing, B. F., et al., "0.4-um . . . Contrast Enhancement Lithography", IEEE Electron Device Letters, vol. EDL-4, No. 9, 9/1983, pp. 317-320.
Griffing, B. F., et al., "Application of . . . Projection Printing", SPIE, vol., 469, 1984, pp. 94-101.
West, P. R. et al., "Contrast Enhancement . . . Lithography", Crans D, #394CRD03, date unknown, 6 pages.
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