Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-09-15
2008-09-02
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S910000, C526S266000, C526S268000, C526S270000, C526S281000, C526S284000, C560S116000, C560S126000, C560S128000
Reexamination Certificate
active
07419761
ABSTRACT:
A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and can produce fine photoresist patterns due to its low PEB (Post Exposure Baking) temperature sensitivity.
REFERENCES:
patent: 4975519 (1990-12-01), Yang et al.
patent: 5891603 (1999-04-01), Kodama et al.
patent: 5942367 (1999-08-01), Watanabe et al.
patent: 6027854 (2000-02-01), Nishi et al.
patent: 6136502 (2000-10-01), Satoshi et al.
patent: 6146811 (2000-11-01), Kim et al.
patent: 7288363 (2007-10-01), Koitabashi et al.
patent: 7312016 (2007-12-01), Koitabashi et al.
patent: 2002/0143130 (2002-10-01), Lee et al.
patent: 02/20214 (2002-03-01), None
Kim Deog-Bae
Kim Jae-Hyun
Lee Jae-Woo
Lee Jung-Youl
Son Eun-Kyung
Chu John S
Dongjin Semichem Co., Ltd.
Tuchman & Park LLC
LandOfFree
Photoresist monomer having spiro cyclic ketal group, polymer... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photoresist monomer having spiro cyclic ketal group, polymer..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist monomer having spiro cyclic ketal group, polymer... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3988650