Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1983-12-30
1986-01-14
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430 22, 430156, 430315, 430317, 430318, 430323, 430324, 430325, 430326, 430329, G03F 726, G03F 900
Patent
active
045645841
ABSTRACT:
A method making self-aligned semiconductors utilizing two resist masking steps to form a device; making one of the masks insoluable with respect to the other so that when a first part of the device is formed by a first mask, and a second part of the device is formed by the second masks, the parts are self-aligned when the first resist is dissolved.
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Havas, J. et al., IBM Tech. Discl. Bulletin, vol. 21, No. 6, pp. 2306-2308, 11/1978.
Romankiu et al., IBM Tech. Discl. Bulletin, vol. 18, No. 12, pp. 4219-4221, 5/1976.
IBM TDB, vol. 24, No. 10, p. 5063, entitled "Image Reversal Lift Off Process" by C. J. Hamel et al., Mar. 1982.
IMB TDB, vol. 23, No. 4, p. 1368, entitled "Electron-Beam-Exposed Positive Photoresist Providing Image . . . " by Reagan, Sep. 1980.
IEEE, vol. EDL-1, No. 10, Oct. 1980 entitled "A High Resolution Negative Electron Resist by Image Reversal" by Oldham et al.
Fredericks Edward C.
Kotecha Harish N.
Abzug Jesse L.
Bowers Jr. Charles L.
Hoel John E.
IBM Corporation
Klitzman Maurice H.
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