Photoresist layer supporting polyester film and photoresist film

Details Photoresist layer supporting polyester film and photoresist film Photoresist layer supporting polyester film and photoresist film

1997-08-06

1999-03-09

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302731, 430162, 4283044, 428149, 4283073, 428402, 428480, G03F 711, G03F 709

Patent

active

058798544

ABSTRACT:
A photoresist layer supporting polyester film which is a biaxially oriented film formed from a polyester containing 0.01 to 0.1% by weight of porous silica particles that are agglomerates of primary particles having an average particle diameter of 0.01 to 0.1 .mu.m and have an average particle diameter of 0.1 to 5 .mu.m and a pore volume of 0.5 to 2.0 ml/g, the number of the porous silica coarse particles having a major diameter of not smaller than 50 .mu.m being 10 or less per m.sup.2 ; and a photoresist film laminate comprising the above polyester film and a photoresist layer and a protective film, the photoresist layer and the protective film being laminated on one surface of the photoresist layer supporting polyester film. The above photoresist layer supporting polyester film is excellent in transparency and handling properties (slipperiness), and the above photoresist film laminate has excellent resolution and is almost free from circuit defect.

REFERENCES:
patent: 4818581 (1989-04-01), Katoh et al.
patent: 5318833 (1994-06-01), Fujimoto et al.
patent: 5384191 (1995-01-01), Ogawa et al.
patent: 5648159 (1997-07-01), Sato
Patent Abstracts of Japan, vol. 15, No. 13, JP 02263694 S, Oct. 26, 1990.

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