Photoresist having increased sensitivity and use thereof

Details Photoresist having increased sensitivity and use thereof Photoresist having increased sensitivity and use thereof

1996-06-05

1998-05-19

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430905, 430907, 430914, 430915, 430919, 430920, 430922, 430923, 430924, 430330, 522 9, 522 16, 522 17, 522 25, 522 26, 522 27, 522 28, 522 30, 522 18, 522 20, 522 21, 522 12, G03F 7039, G03F 730, G03F 738

Patent

active

057534128

ABSTRACT:
The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-l,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.

REFERENCES:
patent: 1587269 (1926-06-01), Murray
patent: 3779778 (1973-12-01), Smith et al.
patent: 4250053 (1981-02-01), Smith
patent: 4258121 (1981-03-01), Kojima
patent: 4343885 (1982-08-01), Reardon, Jr.
patent: 4618564 (1986-10-01), Demmer et al.
patent: 5198323 (1993-03-01), Kitao et al.
patent: 5403695 (1995-04-01), Hayase et al.
patent: 5466557 (1995-11-01), Haley et al.
patent: 5492793 (1996-02-01), Breyta et al.

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