Photoresist film and process for producing back plate of plasma

Details Photoresist film and process for producing back plate of plasma Photoresist film and process for producing back plate of plasma

1997-11-12

2000-08-22

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430 6, 430 7, 430912, G03C 176

Patent

active

061069922

ABSTRACT:
A photoresist film which can form an even fluorescent substance layer, in intimate contact with the surface of cells, in a simplified manner, and a back plate of PDP using the film are provided. More specifically, a photoresist film comprising a base film and, provided on the base film, a photosensitive resin composition layer comprising a fluorescent substance, a photosensitive resin, and a volatile organic material, and a process for producing a back plate of PDP using the film are provided.

REFERENCES:
patent: 5518843 (1996-05-01), Hara et al.
patent: 5622794 (1997-04-01), Sato et al.
patent: 5707781 (1998-01-01), Wilczak
patent: 5714286 (1998-02-01), Uchikawa et al.
patent: 5738970 (1998-04-01), Hsieh et al.
patent: 5759739 (1998-06-01), Takemura et al.
patent: 5909083 (1999-06-01), Asano et al.
patent: 6039622 (2000-03-01), Kosaka et al.

Affiliated with

Also associated with

Rating

Photoresist film and process for producing back plate of plasma does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoresist film and process for producing back plate of plasma , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist film and process for producing back plate of plasma will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-578763