Photoresist film and method for forming pattern thereof

Details Photoresist film and method for forming pattern thereof Photoresist film and method for forming pattern thereof

1999-02-23

2000-08-08

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430312, 430313, 430325, G03F 726

Patent

active

061000108

ABSTRACT:
A photoresist includes a three-layer structure of a lower layer, a middle layer and an upper layer, wherein the lower and upper layers are photoresist layers, the lower layer is sensitive to a light having a longer wavelength than a light to which the upper layer is sensitive, and the middle layer is a light-shielding film formed of an organic substance that has a transmittance such that the lower layer is not exposed to lights to which the lower and upper layers are sensitive.

REFERENCES:
patent: 4370405 (1983-01-01), O'Toole et al.
patent: 4591546 (1999-02-01), West et al.
patent: 5871886 (1999-02-01), Yu et al.

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