Photoresist developer containing fluorinated amphoteric surfacta

Details Photoresist developer containing fluorinated amphoteric surfacta Photoresist developer containing fluorinated amphoteric surfacta

1992-01-24

1992-11-17

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430325, 430326, G03E 732, G03C 500

Patent

active

051642867

ABSTRACT:
Described herein is a developer for alkali developable photoresists which comprises the addition of a selected fluorinated amphoteric surfactant to an aqueous basic solution.

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