Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1997-03-18
2000-10-03
Dote, Janis L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430313, 430325, 430329, 430331, G03F 732, G03F 742
Patent
active
061270970
ABSTRACT:
Simple, environmentally friendly developers and strippers are disclosed for free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and photoresists. Both the developers and the strippers include benzyl alcohol, optionally also including a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water.
REFERENCES:
patent: 3619285 (1971-11-01), Feldstein
patent: 4500629 (1985-02-01), Irving et al.
patent: 4615763 (1986-10-01), Gelorme et al.
patent: 4786578 (1988-11-01), Neisius et al.
patent: 4846929 (1989-07-01), Bard et al.
patent: 4857143 (1989-08-01), Glenning et al.
patent: 5185235 (1993-02-01), Sato et al.
patent: 5268260 (1993-12-01), Bantu et al.
DuPont Material Safety Data Sheet for "Vacrel" 900 Series Photopolymer Film Solder Masks (Vapors), Printed Apr. 23, 1991 pp. 1-4.
IBM Data Sheets Dated Sep. 30, 1982 of Tradenames Vacrel .RTM.Series 900, 930, 930-A, pp. 1-4, with Attached Appendix, Notes 1 to 5.
Reader's Digest Complete Do-It-Yourself Manual, Reader's Digest Association, Inc. (Sep. 1981) p. 245.
Shaw, Jane, "Polymers for Electronic and Photonic Applications", p. 17 (1993).
Bantu Nageshwer Rao
Bhatt Anilkumar Chinuprasad
Bhatt Ashwinkumar Chinuprasad
Jones Gerald Walter
Kotylo Joseph Alphonse
Dote Janis L.
Fraley Lawrence R.
International Business Machines - Corporation
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