Photoresist curing method

Details Photoresist curing method Photoresist curing method

1982-07-23

1984-04-17

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430313, 430328, 430394, 2504921, G03C 516

Patent

active

044435339

ABSTRACT:
A method of post-development cure of photoresists is described wherein the substrate carrying the developed photoresist is positioned within 6.0 cm of a flash lamp and flashed with visible light to effect a cure in 30 seconds or less.

REFERENCES:
patent: 4167669 (1979-09-01), Panico
Allen et al., J. of Electrochemical Society, Jun., 1982, pp. 1379-1381.

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