Photoresist containing a thiodipropionate compound

Details Photoresist containing a thiodipropionate compound Photoresist containing a thiodipropionate compound

1976-09-30

1977-11-22

Louie, Jr., Won H.

Gas separation: apparatus

Electric field separation apparatus

Electrode retaining or supporting means

96115R, G03C 152, G03C 168

Patent

active

040594491

ABSTRACT:
This invention relates to a photoresist consisting of a novolak resin and a sensitizer containing a thiodipropionate compound.

REFERENCES:
patent: 3046111 (1962-07-01), Schmidt
patent: 3440212 (1969-04-01), Tholstrup
patent: 3644282 (1972-02-01), Bresson
patent: 3773723 (1973-11-01), Cole
patent: 3933885 (1976-01-01), Satomura
patent: 3950173 (1976-04-01), Ross
DeForest : Photoresist Materials and Processes, McGraw-Hill, 6-1975, pp. 59-60.

Affiliated with

Also associated with

Rating

Photoresist containing a thiodipropionate compound does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoresist containing a thiodipropionate compound, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist containing a thiodipropionate compound will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2257158