Photoresist compositions with cyclic olefin polymers and hydroph

Details Photoresist compositions with cyclic olefin polymers and hydroph Photoresist compositions with cyclic olefin polymers and hydroph

1999-03-11

2000-09-26

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302711, 430905, 430914, 430326, 430 11, 430 17, G03C 173, G03C 174, G03C 176, G03C 556, G03C 516

Patent

active

061240745

ABSTRACT:
Acid-catalyzed positive photoresist compositions which are imageable with 193 nm radiation and are developable to form photoresist structures of high resolution and high etch resistance are enabled by the use of a combination of cyclic olefin polymer, photosensitive acid generator and a hydrophobic non-steroidal multi-alicyclic component containing plural acid labile linking groups. The cyclic olefin polymers preferably contain i) cyclic olefin units having polar functional moieties, ii) cyclic olefin units having acid labile moieties that inhibit solubility in aqueous alkaline solutions.

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