Photoresist compositions with copolymer binder having phenolic a

Details Photoresist compositions with copolymer binder having phenolic a Photoresist compositions with copolymer binder having phenolic a

1993-01-29

1994-08-23

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430192, 430905, 430909, G03F 7004

Patent

active

053406966

ABSTRACT:
The present invention relates to photoresists particularly suitable for deep U.V. exposure and having the capability of forming highly resolved features. The invention is characterized by use of a resist resin binder that comprises a nonaromatic cyclic alcohol-phenol copolymer that has a relatively low molecular weight and narrow distribution of molecular weight and cyclic alcohol concentration.

REFERENCES:
patent: 5128232 (1992-07-01), Thackeray et al.

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