Photoresist compositions containing selected 6-acetoxy cyclohexa

Details Photoresist compositions containing selected 6-acetoxy cyclohexa Photoresist compositions containing selected 6-acetoxy cyclohexa

1987-10-05

1990-02-20

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430271, 430275, 430277, 430278, 430325, 430905, 430918, G03C 1495, G03C 176, G03C 194

Patent

active

049026038

ABSTRACT:
A light-sensitive mixture useful as a negative-working photoresist composition comprising:

REFERENCES:
patent: 3385700 (1968-05-01), Willems et al.
patent: 3385703 (1968-05-01), Poot
patent: 4496647 (1985-01-01), Kawabe et al.
Chemical Abstracts, vol. 67, 99505p.
Chemical Abstracts, vol. 64, 18782(h).
A. J. Waring et al., Stereoselective Photochemical Ring-opening of Cyclohexa-2,4-dienones, J. Chem. Soc., 1971, pp. 3274-3280.
G. Quinkert et al., "Thermally Reversible Photoisomerizations", Angew. Chem. International, vol. 11 (1972) No. 12, pp. 1072-1087.
G. Quinkert et al., "A Photochemical Entry to Macrocyclic Mono- and Dialctones", Angew. Chem. International, vol. 23 (1984), No. 6, pp. 440-442.
G. Quinkert et al., "Adducts of the Ketene (1E, 3Z)-1,2,3,4,5-Pentamethyl-6-oxo-1,3,5-hexatrienyl Acetate", Agnew. Chem. International, vol. 23 (1984), No. 6, pp. 442-444.

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