Photoresist compositions containing copolymers having acid-labil

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430326, 430906, 430910, G03C 173

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055589782

ABSTRACT:
The invention relates to novel maleimide copolymers which, in addition to structural units derived from certain maleimide derivatives defined more precisely in the present patent application, comprises recurring structural units selected from the structural units of the formulae (Ia) and (Ib) ##STR1## where A is a direct single bond or a divalent group of the formula --O--;

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S. Sandler, et al, "Polymer Synthesis" vol. 1, pp. 3-21, 1992, Academic Press, New York.
D. J. H. Funhoff, et al. "Deep-UV Resists with Improved delay capacities", SPIE vol. 1672 pp. 46-55 (1992).

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