Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2005-06-28
2005-06-28
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S192000, C430S193000, C430S270100, C430S326000, C430S905000, C430S910000
Reexamination Certificate
active
06911293
ABSTRACT:
Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.
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Notification of Transmittal of the International Preliminary Examination Report (Form PCT/IPEA/416).
International Preliminary Examination Report (Form PCT/IPEA/409.
Notification of Transmittal of the International Preliminary Examination Report (Form PCT/IPEA/416).
McKenzie Douglas
Oberlander Joseph E.
Plass Robert R.
Wanat Stanley F.
Chu John S.
Clariant Finance (BVI) Limited
Kass Alan P.
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