Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Processing feature prior to imaging
Patent
1998-02-20
2000-04-11
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Processing feature prior to imaging
430313, 430322, 134 13, G03F 700
Patent
active
060486724
ABSTRACT:
The invention includes use of a positive chemically amplified photoresist composition that produces a strong photogenerated acid. The resist is coated onto a metal substrate that has been subjected to a stringent bake step, e.g. heating of the substrate at about at least 140.degree. C. for more than 60 seconds. The combined use of strong photogenerated acid and stringent pre-coating substrate bake provides highly resolved resist relief images, including on metal substrates.
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Cameron James F.
Rajaratnam Martha M.
Sinta Roger F.
Thackeray James W.
Cairn S. Matthew
Corless Peter F.
Duda Kathleen
Frickey Darryl P.
Shipley Company L.L.C.
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