Photoresist compositions

Details Photoresist compositions Photoresist compositions

2005-06-28

2005-06-28

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S286100, C430S322000, C430S328000, C430S330000

Reexamination Certificate

active

06911297

ABSTRACT:
Radiation sensitive compositions for use in producing a patterned image on a substrate comprise:a) a first photoacid generator compound which comprises one or more compounds of the structure (A);b) a second photoacid generator compound which comprises one or more compounds of the structure (B);c) a polymer component comprising an alkali soluble resin component whose alkali solubility is suppressed by the presence of acid sensitive moieties and whose alkali solubility is returned by treatment with an acid and, optionally, heat;wherein said polymer comprises one or more polymers comprising the monomer unit (C); andd) a solvent.

REFERENCES:
patent: 2004/0072094 (2004-04-01), Shima et al.
patent: 2002131898 (2002-05-01), None
patent: 2002131898 (2002-05-01), None
English language abstract of JP 2002-131898.
PCT International Search Report based off of PCT/US03/21031 with a filing date Aug. 25, 2004.

Affiliated with

Also associated with

Rating

Photoresist compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoresist compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3469411