Photoresist composition for organic layer of liquid crystal...

Details Photoresist composition for organic layer of liquid crystal... Photoresist composition for organic layer of liquid crystal...

2008-04-29

2008-04-29

Schilling, Richard L. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S270100, C430S319000, C430S327000, C430S328000, C430S905000, C430S910000

Reexamination Certificate

active

07364833

ABSTRACT:
The invention relates to a photoresist composition for an organic layer for a liquid crystal display, which may be used for a large-scale substrate, a spin-less coating method using the composition, a method for fabricating an organic layer pattern, and a liquid crystal display having the organic layer pattern. In particular, the liquid crystal display photoresist composition comprises an organic polymer resin having an average molecular weight in the range of about 2,000 to about 20,000, a mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM, and a photosensitizer.

REFERENCES:
patent: 2006/0166114 (2006-07-01), Lee
patent: WO 2004097522 (2004-11-01), None
patent: WO 2004/107053 (2004-12-01), None

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