Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-05-01
2007-05-01
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S907000, C430S910000
Reexamination Certificate
active
10658840
ABSTRACT:
The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1,The invention also relates to a process for imaging the photoresist composition of the present invention, and to a process of making the polymer in the presence of an organic base.
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Dammel Ralph R.
Houlihan Francis M.
Sakamuri Raj
AZ Electronic Materials USA Corp.
Chu John S.
Jain Sangya
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