Photoresist composition containing modified cyclized diene polym

Details Photoresist composition containing modified cyclized diene polym Photoresist composition containing modified cyclized diene polym

1980-04-02

1981-10-13

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415914, 20415922, 430287, 430288, G03C 168

Patent

active

042949084

ABSTRACT:
A photoresist composition comprising a cyclized product obtained by contacting a conjugated diene polymer or copolymer having unsaturations in the main chain or side chains with a fluorine-containing substituted sulfonic acid compound represented by the formula:

REFERENCES:
patent: 3808155 (1974-04-01), Broyde
patent: 3842019 (1974-10-01), Kropp
patent: 3948667 (1976-04-01), Ichikawa et al.

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