Photoresist composition containing alkyletherified polyvinylphen

Details Photoresist composition containing alkyletherified polyvinylphen Photoresist composition containing alkyletherified polyvinylphen

1994-05-25

1996-12-17

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430325, 430920, 430921, 430924, G03C 173

Patent

active

055852181

ABSTRACT:
A negative or positive photoresist composition which comprises an alkali soluble resin containing at least one resin selected from the group consisting of a partially alkyletherified polyvinylphenol and a partially alkyletherified hydrogenated polyvinylphenol, a photo-induced acid precursor containing at least a kind of sulfonic acid ester of N-hydroxyimide compounds and crosslinking agent or dissolution inhibitor, and this photoresist composition is excellent in various properties such as heat resistance, film thickness retention, coating property, profile and the like, and further exhibits high sensitivity and high resolution when far ultraviolet rays including excimer laser is used as the light source. It also hardly cause a scam during the developing process.

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In SPIE vol. 1086 "Advances in Resist Tech. and Proc . . . "(1989), pp. 2-10.

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