Photoresist composition comprising cyclohexyleneoxyalkyl acrylat

Details Photoresist composition comprising cyclohexyleneoxyalkyl acrylat Photoresist composition comprising cyclohexyleneoxyalkyl acrylat

1987-07-24

1990-02-20

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430288, 430281, 522121, 522142, 522144, G03C 168

Patent

active

049026054

ABSTRACT:
A flexible and nonbrittle negative-working photoresist composition comprises a polymeric binder, a photoinitiator composition, and a polymerizable cyclohexyleneoxyalkyl acrylate monomer characterized by the structural formula: ##STR1## wherein R is H or CH.sub.3,

REFERENCES:
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patent: 3832176 (1974-08-01), Verstraete et al.
patent: 4304838 (1981-12-01), Hasegawa et al.
patent: 4322490 (1982-03-01), Molaire
patent: 4533445 (1985-08-01), Orio
patent: 4567128 (1986-01-01), Bennett
patent: 4619890 (1986-10-01), Molaire et al.

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