Photoresist composition comprising a polyfunctional vinyl ether

Details Photoresist composition comprising a polyfunctional vinyl ether Photoresist composition comprising a polyfunctional vinyl ether

1995-09-08

1998-02-17

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302811, 4302881, 430920, 430921, 522 63, 522181, G03C 172, G03C 173, C08F 250

Patent

active

057190089

ABSTRACT:
A photoresist composition is disclosed which includes:

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Database WPI, Week 9514, Derwent Publications Ltd., London, GB; AN 95-102684 & JP-A-07 028241 (Sumitomo Chemical Company, Ltd.), Jan. 31, 1995--Abstract.

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