Photoresist composition comprising a copolymer of a hydroxystyre

Details Photoresist composition comprising a copolymer of a hydroxystyre Photoresist composition comprising a copolymer of a hydroxystyre

1996-12-13

1999-10-05

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430330, 430910, 522 31, G03F 7004

Patent

active

059621842

ABSTRACT:
The present invention relates to an improved chemically amplified photoresist composition comprising (i) a photosensitive acid generator and (ii) a polymer comprising the reaction product of hydroxystyrene with a monomer selected from acrylate or methacrylate having an alicyclic ester substituent.

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