Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-04-05
2005-04-05
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S907000, C430S910000
Reexamination Certificate
active
06875552
ABSTRACT:
The present invention provides a photoresist composition that reduces standing wave and side wall roughness. The composition comprises a first photoresist X and a second photoresist Y. The first photoresist X absorbs at a higher wavelength than the second photoresist Y. The second photoresist Y has a lower glass transitional temperature than the first photoresist X. A method for making the photoresist composition is also provided.
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Ravi, T.S. et al., PEARL™-PECVD Anti-Reflective Layer for Sub 0.35μm Lithography, Technical Paper, Novellus Systems, Inc. , 12/97, pp. 8.
EEEL, OMP, Metrology supporting Deep Ultraviolet Lithography, Metrology Supporting Deep Ultraviolet Lithography, http://www.eeel.nist.gov, May 6, 2002, pp. 1-5.
Dinsmore & Shohl LLP
Schilling Richard L.
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