Photoresist composition and method of forming a pattern...

Details Photoresist composition and method of forming a pattern... Photoresist composition and method of forming a pattern...

2007-10-16

2007-10-16

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S323000, C430S326000, C430S914000, C430S921000

Reexamination Certificate

active

11141736

ABSTRACT:
A photoresist composition for preventing exposing failures and a method of forming a pattern using the same are disclosed. The photoresist composition preferably comprises about 0.1% to about 0.5% by weight of a photo acid generator, and about 2% to about 10% by weight of a polymer resin, the PAG including a monophenyl sulfonium compound, a triphenyl sulfonium compound or a mixture thereof. The footing phenomenon and the top loss of a pattern are sufficiently prevented.

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