Photoresist composition

Details Photoresist composition Photoresist composition

1996-12-12

1999-11-16

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430920, 430924, G03F 7004

Patent

active

059855118

ABSTRACT:
A positive photoresist composition having excellent various performances (e.g. resolution, resistance to time delay effect, profile), small PEB dependence as well as excellent sensitivity, film retention and coatability, which comprises a polyvinylphenol resin whose phenolic hydroxyl group is partially protected; a sulfonate of a N-hydroxyimide compound as an acid generator; an amine compound; and an electron donor having a redox potential of not more than 1.7 eV is provided.

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patent: 5707776 (1998-01-01), Kawabe et al.
patent: 5846688 (1998-12-01), Fukui et al.

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