Photoresist composition

Details Photoresist composition Photoresist composition

1998-05-22

2000-12-26

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430170, G03F 7004

Patent

active

061656771

ABSTRACT:
A chemical amplifying type positive photoresist composition, excellent in various properties, and not form necking at the potion where the bottom antireflective coating and the resist film contact, which comprises (A) a resin which is converted to alkali-soluble from alkali-insoluble or alkali slightly soluble by the action of an acid, (B) an acid generator, (C) a tertiary amine compound and (D) a diphenyl sulfone compound, and a fine photoresist pattern can be formed in high precision using the photoresist composition.

REFERENCES:
patent: 5580695 (1996-12-01), Murata et al.
patent: 5593812 (1997-01-01), Babich et al.
patent: 5817444 (1998-10-01), Sato et al.
patent: 5962180 (1999-11-01), Iwanaga et al.
patent: 5985511 (1999-11-01), Yako et al.

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