Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-05-22
2000-03-21
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430905, G03F 7004
Patent
active
060401125
ABSTRACT:
A chemical amplifying type positive photoresist composition, excellent in various properties such as film retention ratio, applicability, heat resistance, sensitivity, resolution, profile and time delay resistance, and not easily affected by environment, which comprises (A) a resin which is converted to alkali-soluble by the action of an acid, (B) an acid generator and (C) a tertiary amine compound having an ether bond; and a fine photoresist pattern can be formed in high precision using the photoresist composition.
REFERENCES:
patent: 5556734 (1996-09-01), Tamachika et al.
patent: 5580695 (1996-12-01), Murata et al.
patent: 5658706 (1997-08-01), Niki et al.
patent: 5683856 (1997-11-01), Aoai et al.
patent: 5693452 (1997-12-01), Aoai et al.
patent: 5750309 (1998-05-01), Hatakeyama et al.
Fukui Nobuhito
Takagaki Hiroshi
Takahashi Kenji
Yako Yuko
Chu John S.
Sumitomo Chemical Company Limited
LandOfFree
Photoresist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photoresist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-729145