Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-02-15
2005-02-15
Kelly, Cynthia H. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S288100, C430S281100, C430S285100, C430S284100, C430S325000, C430S906000, C430S905000, C430S910000, C430S907000, C430S311000, C430S319000, C430S916000, C430S270100
Reexamination Certificate
active
06855480
ABSTRACT:
Disclosed are photoimageable compositions having improved stripping properties as well as methods for manufacturing printed wiring boards using such photoimageable compositions.
REFERENCES:
patent: 3953309 (1976-04-01), Gilano et al.
patent: 4003877 (1977-01-01), Lipson et al.
patent: 4610951 (1986-09-01), Lipson et al.
patent: 4710446 (1987-12-01), Hoffmann et al.
patent: 5227281 (1993-07-01), Gaschler et al.
patent: 5789372 (1998-08-01), Fabry
patent: 5807927 (1998-09-01), Stockinger et al.
patent: 5932020 (1999-08-01), Murphy
patent: 5939239 (1999-08-01), Lundy et al.
patent: 5962180 (1999-10-01), Iwanaga et al.
patent: 5998348 (1999-12-01), Murphy
patent: 6017872 (2000-01-01), Pedersen et al.
patent: 6127101 (2000-10-01), Lassila et al.
Barr Robert K.
Kautz Randall W.
Wheeler Stephen H.
Kelly Cynthia H.
Lee Sin J.
Piskorski John J.
Shipley Company L.L.C.
LandOfFree
Photoresist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photoresist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3510758