Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-09-24
1998-09-01
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302701, 430919, 430921, 522 57, G03F 7038, G03F 7039
Patent
active
058009647
ABSTRACT:
Disclosed is a novel and improved photoresist composition which comprises:
(A) a film-forming resinous compound which is, in the presence of an acid, subject to a change in the solubility in an alkaline solution; and
(B) an acid-generating agent capable of releasing an acid by the exposure to actinic rays which is an oxime sulfonate compound represented by the general formula
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patent: 5216135 (1993-06-01), Urano et al.
patent: 5585222 (1996-12-01), Kaimoto et al.
patent: 5660969 (1997-08-01), Kaimoto
Grant et al, eds. Grant & Hackh's Chemical Dictionary, Fifth ed., McGraw-Hill Book Co, New York, NY, 1987, p. 22.
Hada Hideo
Hashiguchi Tatsuya
Komano Hiroshi
Nakayama Toshimasa
Nitta Kazuyuki
Hamilton Cynthia
Tokyo Ohka Kogyo Co. Ltd.
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