Photoresist composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430920, G03F 7039

Patent

active

058466886

ABSTRACT:
A positive-working photoresist composition which exhibits a high sensitivity and a high resolution in addition to excellent characteristics such as heat resistance, film retention ratio, coatability and profile;

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Derwent WPI (Section Ch. Week 9436), Derwent Publications Ltd., London, GB; AN 94-288214 (XP0020303375) & JP 06 214 392A (Sumitomo Chemical Company, Ltd.), 5 Aug. 1994 (Abstract).

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