Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-04-28
1997-02-04
Lesmes, Georges F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302811, 4302781, G03C 173
Patent
active
055996507
ABSTRACT:
The present invention provides a lithographic printing plate comprising a substrate and a photocurable polymeric photoresist, such as those based on free-radical initiated photocuring mechanisms. To constrain detrimental and undesired activity of excess free radicals, an embodiment of the printing plate is further provided with a free-radical regulating system. In a particular embodiment, the free-radical regulating system is provided as an overcoat, the overcoat being a light-transmissive overcoat and comprising a polymer having a pendant free-radical trapping group. A particular polymer for the overcoat has the formula ##STR1## wherein, m is from approximately 20% by weight to approximately 95% by weight, and n is from approximately 0% by weight to approximately 75% by weight. Capable of deactivating free-radicals actinically generated in the photoresist subsequent to exposure, the polymer is soluble in fountain or ink solution and incompatible with the photoresist.
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Bi Daoshen
Fitzgerald Maurice J.
Kearney Frederick R.
Liang Rong-Chang
Schwarzel William C.
de Luna Renato M.
Lesmes Georges F.
Polaroid Corporation
Weiner Laura
LandOfFree
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