Photoprinting process and apparatus for exposing photopolymers

Details Photoprinting process and apparatus for exposing photopolymers Photoprinting process and apparatus for exposing photopolymers

1983-09-23

1985-10-01

Kittle, John

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430327, 430322, 430494, G03C 516

Patent

active

045446261

ABSTRACT:
By exposing a photopolymer layer to radiation under the surface of a liquid medium such as water that does not affect the photopolymer solubility characteristic, disproportionately faster exposure time with lower energy cost and heat dissipation giving longer life to equipment and phototools and reducing production costs. The water additionally synergetically reacts as a coolant dissipating heat and as a release agent permitting photo bearing images to be in direct contact with the photopolymer while being radiated without accumulation of unwanted photopolymer to scratch the image or decrease its resolution.

REFERENCES:
patent: 3573975 (1971-04-01), Dhaka et al.
patent: 3664738 (1972-05-01), Cameron
patent: 3723120 (1973-03-01), Hummel
patent: 3746541 (1973-07-01), Sharp
patent: 4148934 (1979-04-01), Baker
patent: 4201581 (1980-05-01), Thomas et al.
patent: 4346164 (1982-08-01), Tabarelli et al.
W. S. DeForest, Photoresist: Materials and Processes (McGraw-Hill Inc., New York, 1975), pp. 20-33.
W. M. Moreau, "Proximity Printing Photomask", IBM Technical Disclosure Bulletin, vol. 14, No. 9, Feb. 1972, p. 2556.

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