Photopolymerizable water-soluble or water-dispersible mixture co

Details Photopolymerizable water-soluble or water-dispersible mixture co Photopolymerizable water-soluble or water-dispersible mixture co

1984-07-06

1986-04-29

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415915, 20415918, 430917, 430919, 526 83, 526236, 522 83, 522116, G03C 176

Patent

active

045857261

ABSTRACT:
Photopolymerizable water-soluble or water-dispersible mixtures essentially consist of a base polymer, at least one polymerizable ethylenically unsaturated compound, at least one photoinitiator and/or photosensitizer and at least one stabilizer, the thermal polymerization inhibitor being a water-soluble salt of nitrous acid.

REFERENCES:
patent: 3082262 (1963-03-01), Scott
patent: 3418300 (1968-12-01), Nakajima et al.
patent: 4239849 (1980-12-01), Lipson et al.
patent: 4278752 (1981-07-01), Gervey et al.
patent: 4340686 (1982-07-01), Foss
patent: 4434223 (1984-02-01), Kohira et al.

Affiliated with

Also associated with

Rating

Photopolymerizable water-soluble or water-dispersible mixture co does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photopolymerizable water-soluble or water-dispersible mixture co, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photopolymerizable water-soluble or water-dispersible mixture co will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-141570