Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-06-13
1993-08-17
Bowers,, Jr.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430281, 430285, 430288, 430906, 430910, 430954, G03F 7025, G03F 7027, G03F 7031, G03F 7033
Patent
active
052368092
ABSTRACT:
The present invention relates to a photopolymerizable resin composition developable with an aqueous weak alkaine solution and suitable for a printed circuit board.
The photopolymerizable resin composition of the present invention is mainly composed of:
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Chemical Abstract, vol. 106, No. 41619j, "Photopolymerizable Compositions".
Chemical Abs vol. 109 No. 83462v "Benzotriazolecarboxylic acid additive for positive . . . ".
Chemical Abs vol. 94 No. 183442d "Developers for diazo-type presensitized lith. plates".
Chemical Abs. vol. 109 No. 240742f "Preparation of printing plates from photosens. lith. plates".
Chem. Abs. vol. 84 No. 172175m "Light-Sensitive Comp. for Printing Plates".
U.S. application 07/332,917 "Photopolymerizable Composition".
Onodera Junichi
Otawa Shigeru
Bowers, Jr.
Chu John S.
Tokyo Ohka Kogyo Co. Ltd.
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