Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1979-08-08
1981-03-10
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415918, 20415923, 430287, 430288, 430910, 430916, 430919, G03C 168
Patent
active
042555132
ABSTRACT:
A photosensitive material is described which comprises a base and a solid photosensitive layer comprising a photopolymerizable compound and a photopolymerization initiating mixture consisting of an oxime ester, a photopolymerization initiator and a p-dialkylaminobenzene of the formula ##STR1## wherein R.sup.1 and R.sup.2 are lower alkyl, R.sup.3 is hydrogen, alkyl, alkoxy or N(R.sup.1) (R.sup.2) and X is --CO--, --CS--, CH.sub.2, or --CH(OH)--.Synergistic photocuring sensitivity is obtained by said oxime ester in admixture with said p-dialkyl aminobenzene compound.
REFERENCES:
patent: 3549367 (1970-12-01), Chang et al.
patent: 3558309 (1971-01-01), Laridon et al.
patent: 3682642 (1972-08-01), Laridon et al.
patent: 3847610 (1974-11-01), Laridon et al.
De Winter Walter F.
Kokelenberg Hendrik E.
Laridon Urbain L.
Marien August M.
AGFA-GEVAERT N.V.
Brammer Jack P.
Breiner A. W.
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